Chemical Vapour
Deposition System
Chemical Vapor Deposition (CVD) is a high-temperature process used to deposit thin films by chemically reacting vapor-phase precursors on heated substrates. These systems are essential for producing semiconductors, nanomaterials, optoelectronics, and protective coatings.
Our portfolio of CVD systems includes both Hot Wall and Cold Wall configurations each designed with precision, flexibility, and process control in mind. With over 50 custom-developed systems, we cater to a broad spectrum of research and industrial requirements.
Uniform chamber heating ensures consistent deposition, making them ideal for applications like photovoltaic coatings, refractory ceramics, and optical layers. We offer reaction tube diameters up to 120 mm and multi-zone heating for superior process control.
Applications:
- Dielectric layers for semiconductors
- Ceramic & wear-resistant coatings
- Solar cell manufacturing
Only the substrate is heated, keeping chamber walls cool to prevent unwanted deposition. This enables faster cycling, high purity, and is ideal for sensitive nanomaterials.
Applications:
- Graphene & carbon nanotube synthesis
- MEMS & microelectronics
- Barrier & conductive films for packaging
Our CVD systems are designed with flexibility and performance in mind supporting a range of process types, control options, and heating architectures to meet diverse application needs.
Heating Architecture
Inductive heating for highly uniform substrate temperature
Multi-zone control for consistent thermal gradients
Atmosphere Control
Vacuum, inert, or reducing environments
Precise gas flow management using multi-channel MFCs
Heating Architecture
Inductive heating for highly uniform substrate temperature
Multi-zone control for consistent thermal gradients
APCVD
Atmospheric Pressure CVD:
Ideal for industrial coatings & solarÂ
cells
LPCVD
Low Pressure CVD:
Ensures uniform thin films for
semiconductors
MOCVD
Metal Organic CVD:
For LEDs, laser diodes, and
optoelectronic materials